Exposure apparatus

Details Exposure apparatus Exposure apparatus

1990-02-14

1991-07-02

Hix, L. T.

Photocopying

Projection printing and copying cameras

Step and repeat

355 68, G03B 2742, G03B 2772

Patent

active

050289551

ABSTRACT:
An exposure apparatus of this invention is used in an exposure process of semiconductor and LCD devices. The exposure apparatus includes a stage on which a semiconductor wafer is placed, a rotating mechanism for rotating the stage, a radiation unit arranged to oppose a support surface of the stage, a slider mechanism for reciprocating the radiation unit along a straight line passing through the center of the support surface of the stage, an exposure range input unit for inputting a desired exposure range of the wafer, an exposure range memory unit for storing the input exposure range, a CCD image sensor for detecting a reference position of the wafer, a relative position detector for detecting a relative position between the detected reference position and the radiation unit, a controller for controlling the sliding mechanism in correspondence with the relative position and the exposure range, and a light amount control mechanism for controlling an amount of light radiated from the irradiation mechanism to the wafer in correspondence with the relative position and the exposure range.

REFERENCES:
patent: 4647172 (1987-03-01), Batchelder et al.
patent: 4910549 (1990-03-01), Sugita

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