Exposure apparatus

Details Exposure apparatus Exposure apparatus

2007-07-09

2009-02-24

Chowdhury, Tarifur (Department: 2886)

Optics: measuring and testing

By light interference

For dimensional measurement

C356S498000, C356S508000

Reexamination Certificate

active

07495771

ABSTRACT:
In an exposure apparatus having a plurality of substrate stages moving between a plurality of stations, errors due to the combination of the stage and a position measuring unit, such as Abbe error and errors due to the surface configuration of a reflection mirror, are precisely corrected to reduce the position error of the substrate stage. The exposure apparatus includes a control device having a storage unit and a correction unit. The storage unit stores the correction information established every combination of the plurality of substrate stages and a plurality of position measuring units, and the correction unit corrects the result measured by the plurality of position measuring units on the basis of the correction information corresponding to the combination of the substrate stages and the position measuring units among pieces of correction information stored in the storage unit.

REFERENCES:
patent: 6400441 (2002-06-01), Nishi et al.
patent: 2006/0187431 (2006-08-01), Shibazaki
patent: 2000-323404 (2000-11-01), None
patent: 2001-059704 (2001-03-01), None

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