Exposure apparatus

Details Exposure apparatus Exposure apparatus

2007-10-16

2007-10-16

Rutledge, D. (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000, C355S071000, C359S494010, C356S364000

Reexamination Certificate

active

11366536

ABSTRACT:
In an exposure apparatus, light flux from a light source is serially converted into any of a plurality of polarized light beams perpendicular to each other on Poincare sphere and is output. This polarized light beam is injected into a projection optical system or the like to be converted into a converted polarized light beam based. With a linear polarizer or a linear phase retarder being properly inserted into an optical path of the converted polarized light beam, a light intensity is measured. Stokes parameters of the converted polarized light beam are calculated based on the measured light intensity.

REFERENCES:
patent: 5072126 (1991-12-01), Progler
patent: 6208415 (2001-03-01), De Boer et al.
patent: 6266141 (2001-07-01), Morita
patent: 6473179 (2002-10-01), Wang et al.
patent: 6844972 (2005-01-01), McGuire, Jr.
patent: 2005/0264813 (2005-12-01), Giakos

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