Exposure apparatus

Details Exposure apparatus Exposure apparatus

1995-05-24

1996-06-04

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

355 53, G21K 500

Patent

active

055235743

ABSTRACT:
An exposure apparatus has an illumination system for illuminating a mask with a light beam, a projection optical system for projecting a mask pattern on a photosensitive substrate and a carriage for integrally holding the mask and the photosensitive substrate. The exposure apparatus further has a detection system for detecting a change in attitude of the carriage and a correction system for correcting a positional deviation between the mask and the photosensitive substrate on the basis of a detected result of the detection system.

REFERENCES:
patent: 4924257 (1990-05-01), Jain

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