Exhaust ring of dry etching device

Details Exhaust ring of dry etching device Exhaust ring of dry etching device

2005-08-09

2005-08-09

Zervigon, Rudy (Department: 1763)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With workpiece support

C118S728000, C118S7230AN

Reexamination Certificate

active

06926802

ABSTRACT:
An exhaust ring made of a material other than quartz, thereby reducing the creation of polymer particles on the exhaust ring is provided in the present invention. The exhaust ring of the present invention is formed of two parts wherein only one part is exposed to and etched by plasma. Accordingly, only the etched and damaged part will require replacement due to plasma damage, thus reducing production costs. More particularly, the exhaust ring comprises an upper ring that is exposed to plasma and a lower ring that is not exposed to plasma.

REFERENCES:
patent: 5389197 (1995-02-01), Ishimaru et al.
patent: 6170429 (2001-01-01), Schoepp et al.
patent: 6178919 (2001-01-01), Li et al.

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