Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2006-11-08
2010-06-01
Stafira, Michael P (Department: 2886)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S237200
Reexamination Certificate
active
07728968
ABSTRACT:
A system and method for inspecting a specimen, such as a semiconductor wafer, including illuminating at least a portion of the specimen using an excimer source using at least one relatively intense wavelength from the source, detecting radiation received from the illuminated portion of the specimen, analyzing the detected radiation for potential defects present in the specimen portion.
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Armstrong J. Joseph
Brown David Lee
Chuang Yung-Ho
Tsai Bin-Ming Benjamin
KLA-Tencor Technologies Corporation
Smyrski Law Group, A P.C.
Stafira Michael P
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