Excimer laser inspection system

Details Excimer laser inspection system Excimer laser inspection system

2006-11-14

2006-11-14

Stafira, Michael P. (Department: 2877)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

Reexamination Certificate

active

07136159

ABSTRACT:
A system and method for inspecting a specimen, such as a semiconductor wafer, including illuminating at least a portion of the specimen using an excimer source using at least one relatively intense wavelength from the source, detecting radiation received from the illuminated portion of the specimen, analyzing the detected radiation for potential defects present in the specimen portion.

REFERENCES:
patent: 1973066 (1934-09-01), Hauser et al.
patent: 2661658 (1953-12-01), Dyson
patent: 3237515 (1966-03-01), Altman
patent: 4106046 (1978-08-01), Nathanson et al.
patent: 4155630 (1979-05-01), Ih
patent: 4334199 (1982-06-01), Ham
patent: 4347001 (1982-08-01), Levy et al.
patent: 4511220 (1985-04-01), Scully
patent: 4628938 (1986-12-01), Sandland et al.
patent: 4758088 (1988-07-01), Doyle
patent: 4779966 (1988-10-01), Friedman
patent: 4792695 (1988-12-01), Blandford
patent: 4795244 (1989-01-01), Uehara
patent: 4898471 (1990-02-01), Stonestrom et al.
patent: 4926489 (1990-05-01), Danielson et al.
patent: 4944593 (1990-07-01), Kalstroem et al.
patent: 4971428 (1990-11-01), Moskovich
patent: 4974094 (1990-11-01), Morito
patent: 5031976 (1991-07-01), Shafer
patent: 5067811 (1991-11-01), Ouchi
patent: 5089913 (1992-02-01), Singh et al.
patent: 5114238 (1992-05-01), Sigler
patent: 5140459 (1992-08-01), Sagan
patent: 5177559 (1993-01-01), Batchelder et al.
patent: 5233460 (1993-08-01), Partlo
patent: 5274494 (1993-12-01), Rafanelli et al.
patent: 5303594 (1994-04-01), Kurtz et al.
patent: 5313479 (1994-05-01), Florence
patent: 5323263 (1994-06-01), Schoenmakers
patent: 5428442 (1995-06-01), Lin et al.
patent: 5488229 (1996-01-01), Elliott et al.
patent: 5515207 (1996-05-01), Foo
patent: 5596411 (1997-01-01), Fanton et al.
patent: 5636066 (1997-06-01), Takahashi
patent: 5644140 (1997-07-01), Biedermann et al.
patent: 5668673 (1997-09-01), Suenaga et al.
patent: 5717518 (1998-02-01), Shafer et al.
patent: 5729374 (1998-03-01), Tiszauer et al.
patent: 5774222 (1998-06-01), Maeda et al.
patent: 5798829 (1998-08-01), Vaez-Iravani
patent: 5805334 (1998-09-01), Takahashi
patent: 5805357 (1998-09-01), Omura
patent: 5808797 (1998-09-01), Bloom et al.
patent: 5808805 (1998-09-01), Takahashi
patent: 5835275 (1998-11-01), Takahashi et al.
patent: 5861997 (1999-01-01), Takahashi
patent: 5880891 (1999-03-01), Furter
patent: 5892579 (1999-04-01), Elyasaf et al.
patent: 5990983 (1999-11-01), Hargis et al.
patent: 5999310 (1999-12-01), Shafer et al.
patent: 6057917 (2000-05-01), Petersen et al.
patent: 6064517 (2000-05-01), Chuang et al.
patent: 6082200 (2000-07-01), Aslam et al.
patent: 6132280 (2000-10-01), Tanabe et al.
patent: 6133986 (2000-10-01), Johnson
patent: 6137570 (2000-10-01), Chuang et al.
patent: 6175645 (2001-01-01), Elyasaf et al.
patent: 6188710 (2001-02-01), Besaucele et al.
patent: 6268093 (2001-07-01), Kenan et al.
patent: 6282309 (2001-08-01), Emery
patent: 6285701 (2001-09-01), Albrecht et al.
patent: 6288780 (2001-09-01), Fairley et al.
patent: 6320657 (2001-11-01), Aspnes et al.
patent: 6331885 (2001-12-01), Nishi
patent: 6345065 (2002-02-01), Kleinschmidt et al.
patent: 6426966 (2002-07-01), Basting et al.
patent: 6512631 (2003-01-01), Shafer et al.
patent: 6548797 (2003-04-01), Ai
patent: 6566671 (2003-05-01), Yoshida et al.
patent: 6667796 (2003-12-01), Nishi
patent: 2001/0046247 (2001-11-01), Hartman
patent: 2002/0196418 (2002-12-01), Hagiwara et al.
patent: 108181 (1900-01-01), None
patent: 3742806 (1989-07-01), None
patent: 0798585 (1997-10-01), None
patent: 2269024 (1994-01-01), None
patent: 9712226 (1997-04-01), None
patent: 9908134 (1999-02-01), None
M.R. Bartz et al., “LED Print Analyzer,” IBM Technical Disclosure Bulletin, vol. 14, No. 3, Aug. 1971.
D.S. Goodman, “Darkfield Illuminator Attachment,” IBM Technical Disclosure Bulletin, vol. 27, No. 5, Oct. 1984.
J.L.C. Sanz et al., “Automated Visual Inspection with Dark-Field Microscopy,” Journal of the Optical Society of America, Nov. 1985, USA, vol. 2, No. 11, pp. 1857-1862.
Carl Zeiss Brochure, “MSM 193 Microlithography Simulation Microscope,” MSM 193 device introduced 1999.

Affiliated with

Also associated with

Rating

Excimer laser inspection system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Excimer laser inspection system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Excimer laser inspection system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3629516