Excimer laser apparatus

Details Excimer laser apparatus Excimer laser apparatus

1989-10-04

1990-09-18

Gonzalez, Frank

Coherent light generators

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Gas

372 57, 372 58, H01S 322

Patent

active

049583565

ABSTRACT:
An excimer laser apparatus with an HCl generator. The HCl generator is constructed so that HCl gas is generated by the reaction of a fixed concentration of hydrogen gas in the laser gas mixture with an equivalent amount of metallic chlorides. The reaction occurs at a preset temperature, and the metallic chlorides may be either in the laser gas chamber or in the circulation line of the laser gas. Consequently, the HCl required for laser generation is continuously formed by the H.sub.2 reduction of the metallic chlorides. The HCl loss due to the formation of impurities is automatically replenished to maintain a constant concentration of HCl in the laser gas, which results in stable laser generation. This simplified and dependable excimer laser apparatus can be operated continuously for a long time, since it is not necessary to measure and replenish the HCl lost due to the formation of impurities. Furthermore, instead of using a bomb for the highly toxic HCl gas, a bomb for He mixed with H.sub.2 carrier gas, which has a much lower explosion limit, can be used for this safe excimer laser apparatus.

REFERENCES:
patent: 4317087 (1982-02-01), Sander et al.
patent: 4661963 (1987-04-01), Liu et al.
patent: 4674099 (1987-06-01), Turner
patent: 4740982 (1988-04-01), Hakuta et al.
Lifetime extension of XeCl and KrCl lasers with additives by T. J. McKee et al., pp. 943-945, Jun. 15, 1980.

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