Data processing: database and file management or data structures – Database design – Data structure types
Reexamination Certificate
2005-05-24
2005-05-24
Ali, Mohammad (Department: 2167)
Data processing: database and file management or data structures
Database design
Data structure types
C707S793000
Reexamination Certificate
active
06898596
ABSTRACT:
An optical metrology includes a library, a metrology tool and a library evolution tool. The library is generated to include a series of predicted measurements. Each predicted measurement is intended to match the measurements that a metrology device would record when analyzing a corresponding physical structure. The metrology tool compares its empirical measurements to the predicted measurements in the library. If a match is found, the metrology tool extracts a description of the corresponding physical structure from the library. The library evolution tool operates to improve the efficiency of the library. To make these improvements, the library evolution tool statistically analyzes the usage pattern of the library. Based on this analysis, the library evolution tool increases the resolution of commonly used portions of the library. The library evolution tool may also optionally reduce the resolution of less used portions of the library.
REFERENCES:
patent: 4365303 (1982-12-01), Hannah et al.
patent: 5607800 (1997-03-01), Ziger
patent: 5739909 (1998-04-01), Blayo et al.
patent: 5864633 (1999-01-01), Opsal et al.
patent: 5867276 (1999-02-01), McNeil et al.
patent: 5963329 (1999-10-01), Conrad et al.
patent: 6141657 (2000-10-01), Rothberg et al.
patent: 20020018217 (2002-02-01), Weber-Grabau et al.
patent: 20020033954 (2002-03-01), Niu et al.
patent: 20020035455 (2002-03-01), Niu et al.
patent: 20020038196 (2002-03-01), Johnson et al.
patent: WO 9945340 (1999-09-01), None
patent: WO 0169403 (2001-09-01), None
patent: WO 0175425 (2001-10-01), None
patent: WO 0197280 (2001-12-01), None
patent: WO 0227288 (2002-04-01), None
C.J. Raymond et al., “Scatterometry for the measurement of metal features,”In Metrology, Inspection, and Process Control for Microlithography XIV, Neal T. Sullivan, Editor, Proceedings of SPIE, vol. 3998, 2000, pp. 135-146.
Aikens David M.
Smith Walter Lee
Wen Youxian
Ali Mohammad
Stallman & Pollock LLP
Therma-Wave, Inc.
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