Evaporating material for producing optical thin film

Details Evaporating material for producing optical thin film Evaporating material for producing optical thin film

1995-04-24

1996-11-26

Group, Karl

Compositions: ceramic

Ceramic compositions

Refractory

501104, C04B 3546, C04B 3548

Patent

active

055785360

ABSTRACT:
An evaporation material is employed to form an optical thin film which is adapted to be formed on an optical element such as a lens or the like. The evaporation material is provided such that zirconium oxide (ZrO.sub.2) is mixed with a titanium oxide (TiO.sub.A) having a molar ratio A(O/Ti) of oxygen to titanium in a range of 1.0 to 1.75 so that the mixture assumes a molar ratio (Ti/Zr) of titanium to zirconium in a range of 1.0 to 4.0. The mixture is sintered or fused and solidified.

REFERENCES:
patent: 3934961 (1976-01-01), Itoh et al.
patent: 4609267 (1986-09-01), Deguchi et al.
patent: 4707820 (1987-11-01), Sawamura
patent: 4714308 (1987-12-01), Sawamura et al.
patent: 4784467 (1988-11-01), Akatsuka et al.
Patent Abstracts of Japan, vol. 16, No. 278 (M-1268), Jun. 22, 1992 & JP-A-40 70 330 (Nitto Dendo Corp.), Mar. 5, 1992.
Patent Abstracts of Japan, vol. 10, No. 56 (C-331), Mar. 6, 1986 & JP-A-60 197 867 (Shinnihon Kinzoku Kagaku), Oct. 7, 1985.

Affiliated with

Also associated with

Rating

Evaporating material for producing optical thin film does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Evaporating material for producing optical thin film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Evaporating material for producing optical thin film will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1972913