EUV optics

Details EUV optics EUV optics

2006-08-16

2010-11-30

Souw, Bernard E (Department: 2881)

Optical: systems and elements

Having significant infrared or ultraviolet property

Multilayer filter or multilayer reflector

C359S350000, C359S589000, C250S50400H, C250S505100

Reexamination Certificate

active

07843632

ABSTRACT:
In a first aspect, a method of fabricating an EUV light source mirror is disclosed which may comprise the acts/steps of providing a plurality of discrete substrates; coating each substrate with a respective multilayer coating; securing the coated substrates in an arrangement wherein each coated substrate is oriented to a common focal point; and thereafter polishing at least one of the multilayer coatings. In another aspect, an optic for use with EUV light is disclosed which may comprise a substrate; a smoothing layer selected from the group of materials consisting of Si, C, Si3N4, B4C, SiC and Cr, the smoothing layer material being deposited using highly energetic deposition conditions and a multilayer dielectric coating. In another aspect, a corrosion resistant, multilayer coating for an EUV mirror may comprise alternating layers of Si and a compound material having nitrogen and a 5thperiod transition metal.

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