Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2011-01-25
2011-01-25
Nguyen, Kiet T (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C355S053000
Reexamination Certificate
active
07875865
ABSTRACT:
The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor.
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English translation with verification of U.S. Appl. No. 60/255,214, filed Dec. 13, 2000.
Bosselmann Philipp
Maul Manfred
Scholz Axel
Weiss Markus
Carl Zeiss SMT AG
Fish & Richardson P.C.
Nguyen Kiet T
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