Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1983-07-27
1985-02-12
Powell, William A.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156655, 156656, 156657, 1566591, 156662, 156664, 252 791, B44C 122, C03C 1500, C03C 2506, C23F 102
Patent
active
044989539
ABSTRACT:
A highly selective--greater than 100 to 1--etch for silicon, tantalum, tantalum silicide and tantalum nitride is achieved by using polyatomic halogen fluorides. The selectivity is achievable without employing plasmas or wet etching.
REFERENCES:
patent: 3669774 (1972-06-01), Dismukes
patent: 4314875 (1982-02-01), Flamm
Cook Joel M.
Donnelly Vincent M.
Flamm Daniel L.
Ibbotson Dale E.
Mucha John A.
AT&T Bell Laboratories
Powell William A.
Schneider Bruce S.
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