Etching system having simplified diffuser element removal

Details Etching system having simplified diffuser element removal Etching system having simplified diffuser element removal

1990-08-10

1993-01-19

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156345, 156646, B44C 122

Patent

active

051804670

ABSTRACT:
Using systems and methods wherein the diffuser element can be removed independently of upper electrode assembly removal, maintenance time associated with diffuser plate cleaning can be substantially reduced (e.g., several hours per week of operation). Because a diffuser element should typically be cleaned at least 3-4 times more frequently than the upper electrode assembly, maintenance costs over the course of an annual operating period can therefore be reduced significantly. Further, use of a diffuser element which can be independently removed permits portions of an upper electrode assembly to be frequently cleaned in place, thus further enhancing operability of the etching system without increasing operating costs.

REFERENCES:
patent: 4209357 (1980-06-01), Gorin et al.
patent: 4585920 (1986-04-01), Hoog et al.
patent: 4600464 (1986-07-01), Desilets et al.
patent: 4612077 (1986-09-01), Tracy et al.
patent: 4780169 (1988-10-01), Stark et al.
patent: 4820371 (1989-04-01), Rose
patent: 4859303 (1989-08-01), Kalnitsky et al.
patent: 4960488 (1990-10-01), Law et al.

Affiliated with

Also associated with

Rating

Etching system having simplified diffuser element removal does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Etching system having simplified diffuser element removal, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Etching system having simplified diffuser element removal will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-100565