Etching solutions containing ammonium fluoride and a nonionic al

Details Etching solutions containing ammonium fluoride and a nonionic al Etching solutions containing ammonium fluoride and a nonionic al

1988-05-16

1989-09-05

Lacey, David L.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156657, 252 793, C09K 1308

Patent

active

048635634

ABSTRACT:
Etching solutions used to etch, for example, silicon dioxide coated substrates in the manufacture of integrated circuits comprise an aqueous solution of ammonium fluoride and a wetting amount of a nonionic alkyl amine glycidol adduct. Preferred embodiments of the nonionic alkyl amine glycidol adducts employed in the etching solution of the present invention are those represented by the formulas: ##STR1## wherein R represents an alkyl group having from about 8 to about 18 carbon atoms and mixtures thereof,

REFERENCES:
patent: 2089569 (1937-08-01), Orthner et al.
patent: 3181984 (1965-05-01), Tillis
patent: 3992235 (1976-11-01), Garbarini
patent: 4517106 (1985-05-01), Hopkins et al.
patent: 4582624 (1986-04-01), Enjo et al.
patent: 4620934 (1986-09-01), Hopkins et al.
patent: 4761245 (1988-08-01), Scardera et al.
Fluorad, Fluorochemical Surfactants, a Product Info. Bulletin by 3M, 1982.
Olin Chemical Specialties, Product Data Sheet, Glycidol Surfactant 1OG Specialty Nonionic Surfactant, 1979.

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