Etching process with vibrationally excited SF.sub.6

Details Etching process with vibrationally excited SF.sub.6 Etching process with vibrationally excited SF.sub.6

1981-06-25

1982-05-25

Powell, William

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156643, 156646, 1566591, 156345, H01L 21306

Patent

active

043315046

ABSTRACT:
A substrate which forms a volatile fluoride is etched and directionality is achieved using vibrationally excited SF.sub.6 which has been exposed to laser irradiation. The substrate is etched through a mask having openings smaller than the diffraction limit of the laser light.

REFERENCES:
patent: 3679502 (1972-07-01), Hays
patent: 3866398 (1975-02-01), Vernon, Jr. et al.
patent: 4183780 (1980-01-01), McKenna et al.
patent: 4260649 (1981-04-01), Dension et al.
J. I. Steinfeld et al., "Surface Etching by Laser-generated Free Radicals", Jour. of Electrochem. Soc., vol. 127, p. 514 (1980).
T. J. Chuang, "Infrared Laser Induced Reaction of SF.sub.6 with Silicon Surfaces", Journal of Chemical Phys., 72 (11), Jun. 1980, p. 6303.

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