Etching method using noble gas halides

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

156646, 204192E, 252 791, C23F 100, H01L 21306

Patent

active

041904885

ABSTRACT:
A method for etching using a noble gas halide.

REFERENCES:
patent: 3192016 (1965-06-01), Malm et al.
patent: 3377136 (1968-04-01), Morrow
patent: 3615956 (1971-10-01), Irving et al.
patent: 3975252 (1976-08-01), Fraser et al.
patent: 4028155 (1977-06-01), Jacob

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Etching method using noble gas halides does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Etching method using noble gas halides, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Etching method using noble gas halides will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2112111

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.