Etching method for metal layer of display panel

Details Etching method for metal layer of display panel Etching method for metal layer of display panel

2008-07-08

2008-07-08

Deo, Duy-Vu N (Department: 1792)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

C438S151000, C438S158000, C438S745000, C438S754000

Reexamination Certificate

active

07396708

ABSTRACT:
An etching process of a metal layer of a display panel is provided. First, a substrate with at least one display panel region, a testing device region, and a non-device region is provided. Then, a metal layer is formed over the substrate to cover the display panel region, the testing device region, and the non-device region. Next, a mask is formed on the metal layer to expose a portion of the metal layer. The area of the metal layer exposed by the mask substantially occupies 70%˜88% of the total area of the metal layer. Thereafter, a wet etching process is performed to remove the metal layer exposed by the mask.

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