Etching method employing radiation and noble gas halide

Details Etching method employing radiation and noble gas halide Etching method employing radiation and noble gas halide

1978-08-21

1980-10-07

Massie, Jerome W.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156654, 156657, 156662, 204192E, 219121EM, 252 791, 250492A, 250492B, 430297, H01L 21306

Patent

active

042266661

ABSTRACT:
A method for etching using radiation and a gas.

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Desilets et al., "Reactive Spiecies . . . Compound," IBM Technical Disclosure Bulletin vol. 22, No. 1, (6/79) pp. 111-112.
Hiraoka, "Ion Beam . . . HCl," IBM Technical Disclosure Bulletin vol. 22, No. 2, (7/79), p. 773.

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