Etching material and etching process

Details Etching material and etching process Etching material and etching process

1995-05-08

1997-06-17

Breneman, R. Bruce

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

1566351, 1566561, 252 794, 216102, H01L 2978

Patent

active

056393440

ABSTRACT:
An etching material comprising at least phosphoric acid, acetic acid, and nitric acid, with chromic acid added therein. Also claimed is an etching process using the etching material above, provided that the process comprises selectively etching, by using the solution, an aluminum oxide layer formed on the surface of a material containing aluminum as the principal component thereof.

REFERENCES:
patent: 3825454 (1974-07-01), Kikuchi et al.
patent: 4003772 (1977-01-01), Hanazono et al.
patent: 4336111 (1982-06-01), Graunke
patent: 4900695 (1990-02-01), Takahashi et al.

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