Compositions – Etching or brightening compositions – Inorganic acid containing
Reexamination Certificate
2007-12-25
2007-12-25
Norton, Nadine G. (Department: 1765)
Compositions
Etching or brightening compositions
Inorganic acid containing
C252S079100, C252S079300, C252S079400
Reexamination Certificate
active
10962508
ABSTRACT:
An exemplary etching composition includes about 0.1 to 8% by weight of hydrogen fluoride, about 10 to 25% by weight of ammonium fluoride, about 0.0001 to 3% by weight of a non-ionic polymer surfactant, and water. Using the composition in a wet etching process, an oxide layer may be selectively removed while a pattern or storage electrode including polysilicon may be effectively passivated. The oxide layer may be removed with a high etching selectivity, while at the same time minimizing damage to the polysilicon layer.
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Chon Sang-Mun
Doh In-Hoi
Han Myoung-Ok
Jun Pil-Kwon
Ko Yong-Kyun
Dahimene Mahmoud
Norton Nadine G.
Volentine & Whitt PLLC
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