Etching apparatus

Details Etching apparatus Etching apparatus

1998-09-30

2000-04-18

Valentine, Donald R.

Chemistry: electrical and wave energy

Apparatus

Electrolytic

204297M, 204224M, 204225, C25D 1700, C25D 1704

Patent

active

060511168

ABSTRACT:
An etching apparatus is described comprising a substrate holding segment for holding a substrate with a portion to be etched, an electrolytic bath for maintaining an electrolyte solution therein, a locomotive mechanism for moving the substrate holding segment in order to immerse the substrate held on the substrate holding segment in the electrolyte solution maintained in the electrolytic bath, and a counter electrode holding segment for holding a counter electrode having a pattern corresponding a desired etching pattern to be formed at the portion to be etched of the substrate. The counter electrode is positioned to oppose the substrate held on the substrate holding segment.

REFERENCES:
patent: 2803595 (1957-08-01), Anzaldi
patent: 3798056 (1974-03-01), Okinaka et al.
patent: 4166918 (1979-09-01), Nostrand et al.
patent: 4419530 (1983-12-01), Nath
patent: 4729970 (1988-03-01), Nath et al.
patent: 5084400 (1992-01-01), Nath et al.
patent: 5320723 (1994-06-01), Kami
patent: 5352341 (1994-10-01), Joynor
patent: 5458756 (1995-10-01), Bassous et al.

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