Etching

Details Etching Etching

2004-04-26

2010-02-02

Norton, Nadine G (Department: 1792)

Etching a substrate: processes

Gas phase etching of substrate

Application of energy to the gaseous etchant or to the...

C216S062000, C216S065000, C219S121690, C219S121660, C219S121680, C438S487000

Reexamination Certificate

active

07655152

ABSTRACT:
An etching method includes applying a first electromagnetic radiation to an area of structure, thereby altering a characteristic of the structure in the area, and applying a second electromagnetic radiation to the structure, the second electromagnetic radiation configured to selectively ablate the structure based on the characteristic.

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