Etchants for use in micromachining of CMOS Microaccelerometers a

Details Etchants for use in micromachining of CMOS Microaccelerometers a Etchants for use in micromachining of CMOS Microaccelerometers a

1995-01-27

1998-03-10

Wojciechowicz, Edward

Active solid-state devices (e.g., transistors, solid-state diode

Responsive to non-electrical signal

Physical deformation

257417, 257421, 257522, 257618, 257735, 257773, 437228, 437901, 437921, H01L 2972, H01L 2976

Patent

active

057264805

ABSTRACT:
What is described in the present specification are accelerometers using tiny proof masses and piezoresistive force detection. Conventional wisdom would indicate that this approach would not yield useful sensors. However, in fact, according to the invention, such devices are suitable in a wide range of applications. The devices may include deformable hinges to allow the fabrication of three dimensional structures. A new system has been developed which etches silicon highly selectively at moderate temperatures and without hydrodynamic forces potentially damaging to small structures and features. The system is based on the use of the gas phase etchant xenon diflouride, which is an unremarkable white solid at standard temperature and pressure.

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