Etchant solution for photoresist-patterned metal layers

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

156656, 1566591, 252 792, 252 794, C23F 100, C23F 102, B44C 122, C03C 1500

Patent

active

048956171

ABSTRACT:
An etchant solution comprised of water and:

REFERENCES:
patent: 4230522 (1980-10-01), Martin et al.
Hara et al., "Anisotropic Wet Etching of Aluminum Electrodes by an Evacuated Etching System", Journal of the Electrochemical Society; (12/85) P. 2973-2975.
Akzo Chemical Inc., Product brochure for Aromox Amine Oxides (Copyright 1982).
Product brochure for Varox 365 (Jul. 25, 1978).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Etchant solution for photoresist-patterned metal layers does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Etchant solution for photoresist-patterned metal layers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Etchant solution for photoresist-patterned metal layers will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-644034

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.