Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1978-05-10
1980-09-02
Massie, Jerome W.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
156657, 156664, 156665, 156666, 156656, 252 793, 430316, 430323, H01L 2144, H01L 2188, H01L 21465
Patent
active
042207061
ABSTRACT:
An etchant solution for multilayered metal layers comprising an aqueous solution of from 0.5 to 50 percent by weight of nitric acid, from 0.03 to 1.0 percent by weight of hydrofluoric acid, from 0.05 to 0.5 percent by weight of hydrogen peroxide and from 0.1 to 1.0 percent by weight of sulphuric acid. The solution is compatible with photolithographic techniques and uniformly etches three or more metals.
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Massie Jerome W.
Morris Birgit E.
RCA Corporation
VanDenburgh Howard F.
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