Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1989-02-27
1990-01-30
Powell, William A.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156647, 156655, 156662, 252 792, H01L 21306, B44C 122, C03C 1500, C03C 2506
Patent
active
048971529
ABSTRACT:
The invention provides an etchant and a method of using the etchant for revealing dislocations on low index planes in group II-VI compounds such as (Hg.sub.x Cd.sub.(1-x))Te. The etchant has a composition proportional to 80 ml water, 10 ml of hydrochloric acid, 20 ml of nitric acid, and 8 gm of potassium dichromate. In another embodiment, the concentration of nitric acid is reduced to 0%. The surface of the compound being examined is exposed to the etchant for about 20 second to 6 minutes depending upon the crystallographic plane being examined. The surface is then rinsed in water. For the {111}B plane, additional rinses in a 0.05% solution of bromine in methanol and methanol are used.
REFERENCES:
M. Brown et al., Determination of Slip Planes in Cd.sub.x Hg.sub.(1-x) Te by Etching of Dislocations Introduced by Microhardness Indentations, J. Phys. Colloque C6, 40, 151, (1979).
K. Nakagawa et al., Observation of Dislocations in Cadmium Telluride by Cathodoluminescence Microscopy, Appl. Phys. Letter, 34(9), May 1, 1979, pp. 574-575.
Y-C Lu et al., Etch Pit Studies in CdTe Crystals, J. Vac. Sci. Technol., A3(1), Jan./Feb. 1985, pp. 264-270.
E. P. Warekois et al., Crystallographic Polarity in the II-VI Compounds, J. Appl. Phys., vol. 34, No. 9, Feb. 1962, pp. 690-696.
S. G. Parker and J. E. Pinnel, Revelation of Dislocations in (Hg,Cd)Te by an Etch Technique, J. Electrochem. Soc., vol. 118, No. 11, pp. 1868-1869, Nov. 1971.
Hamann H. Fredrick
Malin Craig O.
Powell William A.
Rockwell International Corporation
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