Etchant for production of electrode plate structure for liquid c

Details Etchant for production of electrode plate structure for liquid c Etchant for production of electrode plate structure for liquid c

1991-08-09

1994-03-22

Hearn, Brian E.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

252 791, 252 792, 437181, 156656, 156652, 156664, H01L 2100

Patent

active

052960960

ABSTRACT:
An ITO (indium tin oxide) film on a substrate is effectively etched by an etchant which is an aqueous solution containing hydrogen iodide and ferric chloride to form an electrode plate structure for liquid crystal display device. The etchant does not corrode an Mo or Mo alloy film and accordingly can selectively etch the ITO film already carrying thereon a pattern of Mo or Mo alloy forming an auxiliary electrode for compensating for the resistivity of the ITO film. The etchant is also effective for etching of the ITO film formed on an organic layer.

REFERENCES:
patent: 4321747 (1982-03-01), Takemura et al.
patent: 4767723 (1988-08-01), Hinsberg et al.
patent: 5094978 (1992-03-01), Miyagaki et al.
patent: 5105291 (1992-04-01), Matsumoto et al.
patent: 5112262 (1992-05-01), Obata et al.

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