Etchant for etching double-layered copper structure and...

Details Etchant for etching double-layered copper structure and... Etchant for etching double-layered copper structure and...

2011-07-12

2011-07-12

Booth, Richard A. (Department: 2812)

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

Including integrally formed optical element

C438S158000, C257SE21561

Reexamination Certificate

active

07977128

ABSTRACT:
An etchant for forming double-layered signal lines and electrodes of a liquid crystal display device includes hydrogen peroxide (H2O2), a phosphate, F-ions, an organic acid having a carboxyl group (—COOH), a copper (Cu) inhibitor, and a hydrogen peroxide (H2O2) stabilizer, wherein each of the double-layered signal lines and electrodes of the liquid crystal display device includes a first layer of one of aluminum (Al), aluminum alloy (Al-alloy), titanium (Ti), titanium alloy (Ti-alloy), tantalum (Ta), and a tantalum alloy (Ta-alloy) and a second layer of copper (Cu).

REFERENCES:
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patent: 5700389 (1997-12-01), Nakagawa
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patent: 5954997 (1999-09-01), Kaufman et al.
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patent: 7229569 (2007-06-01), Seki et al.
patent: 2003/0146512 (2003-08-01), Yang et al.

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