Etchant, detergent and device/apparatus manufacturing method

Details Etchant, detergent and device/apparatus manufacturing method Etchant, detergent and device/apparatus manufacturing method

1993-09-28

1995-04-25

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

252 793, 134 3, B05D 500

Patent

active

054095697

ABSTRACT:
An etchant which generates neither heat nor gas during the process, does not sublimate, is stable for a long period of time, requires no special pipings, and further requires no special treatment of waste water because of containing no organic solvents. The etchant is a solution containing hydrofluoric acid and an-oxoacid or oxoacid salt compound expressed by Mm(XOn)p (where M is hydrogen, one-to three-valence metal or NH.sub.4, m is 1 or 5, X is a halogen element, n is 3, 4 or 6, and p is 1, 2 or 3).

REFERENCES:
patent: H291 (1987-06-01), Boos
patent: 4369099 (1983-01-01), Kohl et al.
patent: 4578419 (1986-03-01), Hall
patent: 4734387 (1988-03-01), Nelson et al.
patent: 5111259 (1992-05-01), Teng et al.
"Chemical etching for the evaluation of hydrogenated amorphous silicon films," T. L. Chu and Shirley S. Chu, Appl. Phys. Lett. 48(26), 30 Jun. 1986 pp. 1783-1784.

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