Compositions – Etching or brightening compositions
Reexamination Certificate
2011-06-28
2011-06-28
Tran, Binh X (Department: 1713)
Compositions
Etching or brightening compositions
C252S079200, C252S079400, C216S103000, C216S106000
Reexamination Certificate
active
07968000
ABSTRACT:
An etchant composition is provided. The etchant composition includes about 40 to about 65 wt % of phosphoric acid, about 2 to about 5 wt % of nitric acid, about 2 to about 20 wt % of acetic acid, about 0.1 to about 2 wt % of a compound containing phosphate, about 0.1 to about 2 wt % of a compound simultaneously containing an amino group and a carboxyl group, and a remaining weight percent of water for the total weight of the composition.
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patent: 2009/0004863 (2009-01-01), Kamimura
Choi Young-Joo
Choung Jong-Hyun
Hong Sun-Young
Jang Sang-Hoon
Jin Young-Jun
Dongwoo Fine-Chem Co., Ltd.
F. Chau & Associates LLC
Samsung Electronics Co,. Ltd.
Tran Binh X
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