Etch process for chromium

Details Etch process for chromium Etch process for chromium

1977-12-09

1979-07-10

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156656, 156659, 252 794, C23F 100

Patent

active

041606914

ABSTRACT:
Chromium/copper/chromium conductor lines and glass-chromium cermet resistor structures are formed on a substrate by a subtractive etch process in which undercutting of the top chromium layer and changes in the resistivity of the cermet are minimized by etching the chromium with a mixture of a low concentration (about 5 to 20% by volume) of concentrated (37%) HCl in about 65 to 95% by volume of an aliphatic alcohol such as glycerine with the remainder, if any, to make 100% being water at an elevated temperature of from about 50.degree. to 95.degree. C.

REFERENCES:
patent: 2230156 (1978-12-01), Carman
patent: 2687345 (1954-08-01), Murray

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