Esters, polymers, resist compositions and patterning process

Details Esters, polymers, resist compositions and patterning process Esters, polymers, resist compositions and patterning process

2005-07-12

2005-07-12

Schilling, Richard L (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S320000, C430S322000, C430S325000, C430S326000, C430S327000, C430S905000, C430S907000, C430S910000, C430S914000, C526S243000, C526S281000, C526S282000, C526S287000, C526S286000

Reexamination Certificate

active

06916592

ABSTRACT:
A resist composition comprising a base polymer having a fluorinated sulfonate or fluorinated sulfone introduced therein is sensitive to high-energy radiation, has excellent transparency, contrast and adherence, and is suited for lithographic microprocessing.

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Fujigaya, T., et al., “A New Photoresist Material for 157 nm Lithography”, Journal of Photopolymer Science and Technology, vol. 15, No. 4, May 30, 2002, pp. 643-654.

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