Ester compounds, polymers, resist composition and patterning pro

Details Ester compounds, polymers, resist composition and patterning pro Ester compounds, polymers, resist composition and patterning pro

1999-05-10

2000-11-14

Killos, Paul J.

Organic compounds -- part of the class 532-570 series

Organic compounds

Carboxylic acid esters

560118, 526281, C07C 6974

Patent

active

061472492

ABSTRACT:
A novel ester compound having an alkylcycloalkyl or alkylcycloalkenyl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.

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patent: 4491628 (1985-01-01), Ito et al.
patent: 4603101 (1986-07-01), Crivello
patent: 5053471 (1991-10-01), Goto et al.
patent: 5069997 (1991-12-01), Schwalm et al.
patent: 5585222 (1996-12-01), Kaimoto et al.
Allen et al., Single Layer Resists With Enhanced Etch Resistance for 193 nm Lithography, Journal of Photopolymer Science and Technology, vol. 7, No. 3, pp. 507-516 (1994).
English Abstract for JP-A 88367/1993.
English Abstract for JP-A 215661/1992.

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