Ester compounds and their preparation, polymers, resist...

Details Ester compounds and their preparation, polymers, resist... Ester compounds and their preparation, polymers, resist...

2011-08-16

2011-08-16

Chu, John S (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S910000, C526S268000, C526S269000, C526S281000, C526S284000

Reexamination Certificate

active

07998657

ABSTRACT:
Novel ester compounds having formulae (1) to (4) wherein A1is a polymerizable functional group having a carbon-carbon double bond, A2is oxygen, methylene or ethylene, R1is a monovalent hydrocarbon group, R2is H or a monovalent hydrocarbon group, any pair of R1and/or R2may form an aliphatic hydrocarbon ring, R3is a monovalent hydrocarbon group, and n is 0 to 6 are polymerizable into polymers. Resist compositions comprising the polymers as a base resin are thermally stable and sensitive to high-energy radiation, have excellent sensitivity and resolution, and lend themselves to micropatterning with electron beam or deep-UV.

REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
patent: 4603101 (1986-07-01), Crivello
patent: 5188585 (1993-02-01), Peters
patent: 5714625 (1998-02-01), Hada et al.
patent: 6004724 (1999-12-01), Yamato et al.
patent: 6063953 (2000-05-01), Hada et al.
patent: 6114083 (2000-09-01), Kawamura et al.
patent: 6261738 (2001-07-01), Asakura et al.
patent: 6692888 (2004-02-01), Barclay et al.
patent: 6916591 (2005-07-01), Ohsawa et al.
patent: 5-88367 (1990-01-01), None
patent: 62-115440 (1990-03-01), None
patent: 2-27660 (1990-06-01), None
patent: 2-19847 (1992-08-01), None
patent: 2-80515 (1993-04-01), None
patent: 9-95479 (1997-04-01), None
patent: 9-230588 (1997-09-01), None
patent: 9-301948 (1997-11-01), None
patent: 2906999 (1999-04-01), None
patent: 4-215661 (2000-11-01), None
patent: 2000/314956 (2000-11-01), None
patent: WO 2004-074242 (2004-09-01), None
Allen et al., “Single Layer Resists with Enhanced ETCH Resistance for 193nm Lithography,” Journal of Photopolymer Science and Technology, vol. 7, No. 3, 1994, pp. 507-516.
Arimitsu et al., “Effect of Phenolic Hydroxyl Residues on the Improvement of Acid-Proliferation-Type Photoimaging Materials,” Journal of Photopolymer Science and Technology, vol. 9, No. 1, 1996, pp. 29-30.
Arimitsu et al., “Sensitivity Enhancement of Chemical-Amplification-Type Photoimaging Materials by Acetoacetic Acid Derivatives,” Journal of Photopolymer Science and Technology, vol. 8, No. 1, 1995, pp. 43-44.

Affiliated with

Also associated with

Rating

Ester compounds and their preparation, polymers, resist... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ester compounds and their preparation, polymers, resist..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ester compounds and their preparation, polymers, resist... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2750357