Erosion reduction for EUV laser produced plasma target sources

Details Erosion reduction for EUV laser produced plasma target sources Erosion reduction for EUV laser produced plasma target sources

2005-06-28

2005-06-28

Church, Craig E. (Department: 2882)

X-ray or gamma ray systems or devices

Source

C250S50400H, C378S122000

Reexamination Certificate

active

06912267

ABSTRACT:
A laser-plasma EUV radiation source (10) that employs one or more approaches for preventing vaporization of material from a nozzle assembly (40) of the source (10) by electrical discharge from the plasma (30). The first approach includes employing an electrically isolating nozzle end, such as a glass capillary tube (46). The tube (46) extends beyond all of the conductive surfaces of the nozzle assembly (40) by a suitable distance so that the pressure around the closest conducting portion of the nozzle assembly (40) is low enough not to support arcing. A second approach includes providing electrical isolation of the conductive portions of the source (40) from the vacuum chamber wall. A third approach includes applying a bias potential (52) to the nozzle assembly (40) to raise the potential of the nozzle assembly (40) to the potential of the arc.

REFERENCES:
patent: 6002744 (1999-12-01), Hertz et al.
patent: 6469310 (2002-10-01), Fiedorowicz et al.
patent: 6647088 (2003-11-01), Schmidt et al.
Wieland, M.; Wilhein, T.; Faubel, M.; Ellert, Ch.; Schmidt, M.; and Sublemontier, O.;“EUV and Fast Ion Emission from Cryogenic Liquid Jet Target Laser-Generated Plasma” Appl. Phys. B 72, 591-597 (2001)/Digital Object Identifier (DOI) 10.1007/s003400100542.

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