Equipment for thermal stabilization process of photoresist patte

Details Equipment for thermal stabilization process of photoresist patte Equipment for thermal stabilization process of photoresist patte

1987-07-29

1988-06-07

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

156643, 156656, 1566591, 156668, 156626, 427 431, 427 541, 430313, 430330, B44C 122, B29C 3700, C03C 1500, C03C 2506

Patent

active

047494360

ABSTRACT:
An equipment (100; 200) for thermal stabilization process of photoresist pattern on semiconductor wafer comprises an ultraviolet lamp (20) by which a photoresist pattern formed on a semiconductor wafer (W) put in a process chamber (S) under vacuum pressure is irradiated with ultraviolet rays of a predetermined strength, and a heater (10) for heating the wafer to a predetermined temperature.

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