Environmentally friendly removal of photoresists used in wet etc

Details Environmentally friendly removal of photoresists used in wet etc Environmentally friendly removal of photoresists used in wet etc

1999-01-08

2000-12-12

McPherson, John A.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Removal of imaged layers

430317, 430323, 430328, 430330, G03F 742

Patent

active

061596663

ABSTRACT:
Normally, a positive photoresist is developed with an alkaline aqueous solution to form patterns, and is subsequently stripped with an organic solvent after the photoresist has served its function. Such strippers are relatively toxic and damaging to the environment, and cannot be handled by standard (community) waste-water treatment facilities. These strippers cannot be easily neutralized, and must be disposed of in a highly specialized and relatively expensive manner. The present invention provides a method of treating positive and negative photoresists during their usage as photo masks such that the photoresists may be removed by less toxic chemicals which can be readily neutralized and handled by conventional waste water treatment facilities.

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