Environmental control in a reticle SMIF pod

Details Environmental control in a reticle SMIF pod Environmental control in a reticle SMIF pod

2008-07-15

2008-07-15

Rutledge, Della (Department: 2851)

Photocopying

Projection printing and copying cameras

Detailed holder for photosensitive paper

C355S075000, C206S449000, C206S454000, C250S492100, C250S492200, C378S034000, C055S318000

Reexamination Certificate

active

07400383

ABSTRACT:
The present invention provides a standardized mechanical interface (SMIF) reticle pod that is configured to provide a controlled environment for supporting a reticle wherein the controlled environment is maintained substantially free of crystal growth causing contaminants. Accordingly, there is provided a layered filter with filter elements capable of filtering particulates and adsorbing gaseous contaminants. The filter has an inwardly facing face generally planar shaped with a surface area that is substantially half or more of the area of the reticle face. The inwardly facing face is placed in close proximity to the reticle patterned surface and has an area that is a significant fraction of the reticle patterned surface area. The SMIF pod is also provided with a purge system configured to inject a very dry gas within the controlled environment to flush the controlled environment of contaminants as well as to regenerate the filter.

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Yield Management Solutions,Reticle Inspection, Spring 2004, pp. 34-37.

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