Enhancing epitaxy and preferred orientation

Details Enhancing epitaxy and preferred orientation Enhancing epitaxy and preferred orientation

1979-04-09

1982-06-08

Bernstein, Hiram

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156DIG88, C30B 2304

Patent

active

043337929

ABSTRACT:
An array of oriented artificial relief features or point defects embraced by parallel planes on a substrate surface influence the orientation of solid films during the course of their growth on the substrate surface. There may be multiple sets embraced in generally parallel planes at an angle to each other that is an integral multiple of 30.degree..

REFERENCES:
patent: 3341361 (1967-09-01), Gorski
patent: 3549432 (1970-12-01), Siversten
patent: 4099305 (1978-07-01), Cho et al.
patent: 4174422 (1979-11-01), Mathews et al.
Growth of Crystals v10 Sheftal Consultans Bureau N.Y. 1976 pp. 185-209, 53-61, 39.52.
Soubshehniya Vestnik Moskovskogo Universiteta No. 3, pp. 102-104, 1972.
Sheftal et al. IZV an SSSR Ser. Fia pp. 140-156, 1957 v21.

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