Enhanced uniqueness for pattern recognition

Details Enhanced uniqueness for pattern recognition Enhanced uniqueness for pattern recognition

2007-05-01

2007-05-01

Pham, Long (Department: 2814)

Semiconductor device manufacturing: process

With measuring or testing

Reexamination Certificate

active

10697825

ABSTRACT:
The present invention describes a test structure with a first set of features which is a subset of product features; and a second set of features adjacent to the first set of features, the second set occupying a smaller area than the first set and the second set being similar to the first set yet being distinguishable from surrounding structures.

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