Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2008-05-07
2010-06-15
Dickey, Thomas L (Department: 2893)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C438S151000, C257SE21424
Reexamination Certificate
active
07737498
ABSTRACT:
Field effect transistor and methods of fabricating field effect transistors. The field effect transistors includes: a semiconductor substrate; a silicon oxide layer on the substrate; a stiffening layer on the silicon oxide layer; a single crystal silicon layer on the stiffening layer; a source and a drain on opposite sides of a channel region of the silicon layer; a gate electrode over the channel region and a gate dielectric between the gate electrode and the channel region.
REFERENCES:
patent: 5442223 (1995-08-01), Fujii
patent: 6566712 (2003-05-01), Hayashi et al.
patent: 6621131 (2003-09-01), Murthy et al.
patent: 6707106 (2004-03-01), Wristers et al.
patent: 6717216 (2004-04-01), Doris et al.
patent: 6917078 (2005-07-01), Bhattacharyya
patent: 7276406 (2007-10-01), Chen et al.
patent: 2004/0070312 (2004-04-01), Penunuri et al.
patent: 2005/0247986 (2005-11-01), Ko et al.
patent: 2006/0189053 (2006-08-01), Wang et al.
G. Lehmann et al., “Young's modulus and density of . . . ”, 2002, Appl. Phys., vol. A74, pp. 41-45.
G. Este and W.D. Westwood, “Stress control in reactivity sputtered AIN and TiN films”, 2987), J. Vac. Sci.Technol., vol. A5 (4), pp. 1892-1897.
Chatty Kiran V.
Gauthier Jr. Robert J.
Rankin Jed Hickory
Robison Robert R.
Tonti William Robert
Dickey Thomas L
Harding W. Riyon
International Business Machines - Corporation
Schmeiser Olsen & Watts
Yushin Nikolay
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