Enhanced radiative zone-melting recrystallization method and app

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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156603, 1566161, 15662071, 15662073, 15662075, 156DIG64, C30B 1316

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active

052960897

ABSTRACT:
A method is provided for zone-melting-recrystallization (ZMR) to produce high quality substantially subboundary-free silicon-on-insulator (SOI) thin films by controlled radiant heating of the silicon film. Using this technique, a much wider experimental parameter range which improves the uniformity of the crystalline quality over the entire SOI film is possible.

REFERENCES:
patent: 3158505 (1964-11-01), Sandor
patent: 3539759 (1970-11-01), Spiro et al.
patent: 3627590 (1971-12-01), Mammel
patent: 4113547 (1978-09-01), Emanuel et al.
patent: 4135027 (1979-01-01), Anthony et al.
patent: 4277320 (1981-07-01), Beguwala et al.
patent: 4280989 (1981-07-01), Seimiya et al.
patent: 4371421 (1983-02-01), Fan et al.
patent: 4435447 (1984-03-01), Ito et al.
patent: 4448632 (1984-05-01), Akasaka
patent: 4479846 (1984-10-01), Smith et al.
patent: 4493977 (1985-01-01), Arai et al.
patent: 4503807 (1985-03-01), Nakayama et al.
patent: 4504730 (1985-03-01), Shimizu
patent: 4535227 (1985-08-01), Shimizu
patent: 4535228 (1985-08-01), Mimura et al.
patent: 4562106 (1985-12-01), Geis et al.
patent: 4659422 (1987-04-01), Sakurai
patent: 4694143 (1987-09-01), Nishimura et al.
patent: 4888302 (1989-12-01), Ramesh
patent: 4889583 (1989-12-01), Chen et al.
patent: 4990374 (1991-02-01), Keeley et al.
patent: 5033407 (1991-07-01), Mizuno et al.
patent: 5034199 (1991-07-01), Zavracky et al.
patent: 5074952 (1991-12-01), Zavracky et al.
patent: 5120509 (1992-06-01), Zavracky et al.
patent: 5160575 (1992-11-01), Chen
patent: 5173271 (1992-12-01), Chen et al.
Fan et al., "Graphite-Strip-Heater Zone-Melting Recrystallization of Si Films" Jrnl. Crys. Growth, vol. 63 (1983) pp. 453-483.
Robinson et al., "Large Area Recrystallization of Polysilicon with Tungsten-Halogen Lamps", Jrnl. Crystal Growth, vol. 63 (1983) pp. 484-492.
Geis et al., "Zone-Melting Recrystallization of Si Films with a Moveable-Strip Heater Oven", Jrnl. Electro. Chem. Tech., Dec. 1982.
Pinizzotto R. F., "Microstructural Defects in Lazer Recrystallized Graphite Strip Heater . . . Systems: A Status Report", Jrnl Crys. Growth, vol. 63 (1983) pp. 559-582.

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