Enhanced plasma etching

Details Enhanced plasma etching Enhanced plasma etching

1990-12-21

1992-05-05

Bueker, Richard

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156668, H01L 2100

Patent

active

051104091

ABSTRACT:
Increased etching rates are obtained by plasma etching wherein the power is applied in a cyclical or oscillating mode.

REFERENCES:
patent: 4357203 (1982-11-01), Zelez
patent: 4568563 (1986-02-01), Jackson et al.
patent: 4585516 (1986-04-01), Corn et al.
patent: 4985112 (1991-01-01), Egitto et al.

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