Enhanced macroparticle filter and cathode arc source

Details Enhanced macroparticle filter and cathode arc source Enhanced macroparticle filter and cathode arc source

2006-03-21

2006-03-21

McDonald, Rodney G. (Department: 1753)

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

C204S298410

Reexamination Certificate

active

07014738

ABSTRACT:
A cathode arc source for depositing a coating on a substrate has an anode and a cathode station for a target, a first filter means comprising a filter duct having at least one bend, and first magnetic means for steering plasma through the filter duct for removal of macroparticles from the plasma. The apparatus comprises a second filter (10) for further removal of macroparticles from the plasma, made up of a baffle (11), an aperture (12) through which plasma can pass and second magnetic means (13) for steering plasma through the aperture. The aperture size may be less than 33% of the duct sectional area at that point. The source can also include an ion beam generator. Also described is a method of depositing coatings of ions using the second filter and closing the aperture in the filter when required.

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