Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1999-03-12
2000-04-11
Baxter, Janet
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430326, 430908, G03F 7039, G03F 730
Patent
active
060486643
ABSTRACT:
The present invention is directed to a process for device fabrication and resist materials that are used in the process. The resist material contains a polymer that contains monomeric units that contain alicyclic formate moieties, and at least one other type of monomeric unit. The polymer may be formed by polymerization or by polymer modification of an existing polymer, and the resulting polymer either has alicyclic moieties incorporated into the polymer backbone or pendant to the polymer backbone via saturated hydrocarbon linkages. A preferred polymerization process is free radical polymerization, in which other monomers are selected for polymerization with the alicyclic moiety-containing monomer on the basis of the ability of the monomer to copolymerize by free radical polymerization. Although the polymers are contemplated as useful in resist materials that are sensitive to radiation in the ultraviolet, and x-ray wavelengths as well as sensitive to electron beam radiation, the polymers are particularly advantageous for use in process in which the exposing radiation is 193 nm, because the amount of ethylenic unsaturation in these resist materials is low.
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Houlihan Francis M.
Rushkin Il'Ya L.
Ashton Rosemary
Baxter Janet
Lucent Technologies - Inc.
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