Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1995-11-03
1997-08-12
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430191, 430192, G03F 7023, G03F 7039, G03F 7004
Patent
active
056564120
ABSTRACT:
The present invention is directed to energy-sensitive resist materials and to a process for device fabrication in which energy-sensitive resist materials are used. The energy-sensitive resist materials contain a polymer wherein at least 10 mole percent of the repeating units that make up the polymer have a sulfonamide moiety. The aqueous base solubility of the sulfonamide moiety provides the polymer with desirable properties. The energy sensitive resist materials also contain a compound that generates acid when exposed to radiation.
In the process of the present invention, a film of the energy-sensitive material is formed on a substrate. The film is exposed to delineating radiation. The pattern is developed by a post-exposure bake step followed by application of an aqueous base developer solution. Exposing the energy-sensitive resist material to radiation alters the aqueous base solubility of the energy-sensitive resist material, rendering the portion of the material that was exposed to radiation significantly more soluble in the developer solution than the portion of the material that was not exposed to radiation. Because the sulfonamide moiety is soluble in developer solution, less of a chemical change is needed to convert the energy sensitive resist material from relatively insoluble to relatively soluble in aqueous base developer solution than comparable energy sensitive resist materials that do not have sulfonamide moieties incorporated into the polymers contained therein.
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Chandross Edwin Arthur
Neenan Thomas Xavier
Botos Richard J.
Hamilton Cynthia
Lucent Technologies - Inc.
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