Abrading – Precision device or process - or with condition responsive... – With indicating
Patent
1997-09-26
1999-03-02
Morgan, Eileen P.
Abrading
Precision device or process - or with condition responsive...
With indicating
451 11, 451 41, 451285, 451288, 438691, 438692, B24B 4900
Patent
active
058762655
ABSTRACT:
A polishing apparatus of the present invention comprises an amplifier for amplifying a first signal being input from the vibration detecting device attached on a second surface plate to then output a second signal, a gain indicator for determining unsuitableness of a gain of the amplifier based on a magnitude of the second signal output from the amplifier and then indicating correction of said gain, a gain adjuster for adjusting the gain of the amplifier based on a gain correction signal output from the gain indicator, a polishing end-point analyzing portion for determining an end-point of polishing based on change in the second signal, and a control portion for terminating drive of the first surface plate based on a polishing end-point signal being output from the polishing end-point analyzing portion.
REFERENCES:
patent: 5222329 (1993-06-01), Yu
patent: 5245794 (1993-09-01), Salugsugan
patent: 5399234 (1995-03-01), Yu et al.
patent: 5643046 (1997-07-01), Ichiro et al.
patent: 5667424 (1997-09-01), Yang
Fujitsu Limited
Morgan Eileen P.
LandOfFree
End point polishing apparatus and polishing method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with End point polishing apparatus and polishing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and End point polishing apparatus and polishing method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-416800