End point detection for direct ion milling to induce...

Details End point detection for direct ion milling to induce... End point detection for direct ion milling to induce...

2006-12-22

2010-11-16

McDonald, Rodney G (Department: 1795)

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

C204S192330, C216S059000, C216S060000, C216S066000, C216S072000, C216S074000, C216S075000, C216S077000

Reexamination Certificate

active

07833388

ABSTRACT:
A method for manufacturing a magnetic layer with a magnetic anisotropy. The method includes an endpoint detection process for determining an end point to carefully control the final thickness of the magnetic layer. The method includes depositing a magnetic layer and then depositing a sacrificial layer over the magnetic layer. A low power angled ion milling is then performed until the magnetic layer has been reached. The angled ion milling can be performed at an angle relative to normal and without rotation in order to form an anisotropic surface texture that induces a magnetic anisotropy in the magnetic layer. An indicator layer may be included between the magnetic layer and the sacrificial layer in order to further improve endpoint detection.

REFERENCES:
patent: 2005/0003561 (2005-01-01), Drewes

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