End point detection

Details End point detection End point detection

1982-12-20

1984-07-31

Kittle, John

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

430 30, 430311, 356448, 356357, 356381, 356382, HO1L 21306

Patent

active

044628609

ABSTRACT:
The clearing point of photoresist development is detected automatically by illuminating the developing photoresist surface with intense monochromatic light. Interfering reflection from the resist-substrate interface and the fast eroding and slow eroding resist surfaces produces fast and slow oscillatory signals. These signals are processed to produce a logical output indicative of the cessation of the fast oscillations in the presence of the continuing slow oscillations signaling the clearing point of development.

REFERENCES:
patent: 4136940 (1979-01-01), Lin
patent: 4142107 (1979-02-01), Hatzakis et al.
patent: 4147435 (1979-04-01), Habeggar
patent: 4198261 (1980-04-01), Busta et al.
patent: 4201579 (1980-05-01), Robinson et al.
patent: 4208240 (1980-06-01), Latos
patent: 4260259 (1981-04-01), Kirk
patent: 4317698 (1982-03-01), Christol et al.
patent: 4367044 (1983-01-01), Booth, Jr. et al.
patent: 4377436 (1983-03-01), Donnelly et al.
Newman, Roger, "Fine Line Lithography," Rockwell International, Anaheim, Calif., 1980, pp. 213-214.

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